Surface Reactions of Co on SiO2 thin layer/Si substrate Studied by LEEM and PEEM

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作者：
Maeda, Fumihiko [1 ]
Hibino, Hiroki [1 ]
Suzuki, Satoru [1 ]
Kobayashi, Yoshihiro [1 ]
Watanabe, Yoshio [2 ,3 ]
Guo, FangZhun [3 ]
机构：
[1] NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato-Wakamiya, Atsugi-shi, Kanagawa, 243-0198, Japan
[2] NTT Advanced Technology, 3-1 Morinosato-Wakamiya, Atsugi-shi, Kanagawa, 243-0198, Japan
[3] Japan Synchrotron Radiation Research Institute, 1-1-1 Kouto Mikazuki-cho, Sayo-gun Hyogo 679-5198, Japan
来源：
e-J. Surf. Sci. Nanotechnol. | / 155-160期
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摘要：
Cobalt - Diffusion - Silica - Substrates - Thin films - X ray diffraction analysis
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