Modeling and in-situ monitoring of the asymmetric exposure and development of holographic grating

被引：0
作者：
Kong P. [1 ,2 ]
Bayanheshig [1 ]
Li W. [1 ]
Tang Y. [1 ]
机构：
[1] Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun
[2] Graduate University of Chinese Academy of Sciences
来源：
Guangxue Xuebao/Acta Optica Sinica | 2010年 / 30卷 / 01期
关键词：
Asymmetry; Development model; Exposure model; Gratings; Holography; In-situ monitoring;
D O I：
10.3788/AOS20103001.0065
中图分类号：
学科分类号：
摘要：
It is asymmetric exposure that generates tilted latent image grating and then influence the shape of the groove during development. In order to simulate the formation of the grating, the asymmetric exposure and development model are introduced, with emphasis on that both the recording sources are on the same side of the substrate. The development of the groove is simulated and the in-situ monitoring curve in the fabrication of holographic grating is calculated. The results indicate that the exposure monitoring curve and development curve of asymmetric exposure are the same with that of symmetrical exposure. The groove will be tilted rectangular or asymmetric trapezoidal when the nonlinear effect is very remarkable or not so remarkable respectively. The asymmetry will be reduced when the nonlinear effect is restrained. A very good agreement between theory and experiment is obtained.
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页码：65 / 69
页数：4
相关论文
共 16 条
  • [1] Meng X., Li L., Methods for increasing sidewall steepness of reactiveion-beam etched, sub-micrometer-period gratings, Acta Optica Sinica, 28, 1, pp. 189-193, (2008)
  • [2] Zhu H., Bayanheshig, Analysis and simulation of diffraction characteristics of the ultraviolet ruled grating master and the second duplicate, Acta Optica Sinica, 27, 7, pp. 1151-1155, (2007)
  • [3] Dill F.H., Optical lithography, IEEE. Trans. Electron Devices, ED-22, 7, pp. 440-444, (1975)
  • [4] Dill F.H., Hornberger W.P., Hauge P.S., Et al., Characterization of positive photoresist, IEEE. Trans. Electron Devices, ED-22, 7, pp. 445-452, (1975)
  • [5] de Mello B.A., da Costa I.F., Lima C.R.A., Et al., Developed profile of holographically exposed photoresist gratings, Appl. Opt., 34, 4, pp. 597-603, (1995)
  • [6] Zanke C., Gombert A., Erdmann A., Et al., Fine-tuned profile simulation of holographically exposed photoresist gratings, Opt. Comm., 154, 1, pp. 109-118, (1998)
  • [7] Karafyllidis I., Hagouel P.I., Thanailakis A., Et al., An efficient photoresist development simulator based on cellular automata with experimental verification, IEEE. Trans. SM, 13, 1, pp. 61-75, (2000)
  • [8] Mashev L., Tonchev S., Formation of holographic diffraction gratings in photoresist, Appl. Phys. A, 26, 3, pp. 143-149, (1981)
  • [9] Zhao J., Li L., Wu Z., In-situ self-monitoring of latent image in fabrication of holographic gratings, Acta Optica Sinica, 24, 6, pp. 851-858, (2004)
  • [10] Zhao J., Li L., Wu Z., Modeling of in-situ monitoring curves during development of holographic gratings, Acta Optica Sinica, 24, 8, pp. 1146-1150, (2004)
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