Development of Active Oxygen Monitor and its Utilization for Surface Treatment Process

被引：0

作者：

Matsumoto, Hiroyuki ^{[1
]}

Iwamori, Satoru ^{[2
]}

机构：

[1] Research and Development Department, Iwasaki Electric Co., Ltd., Gyoda-city, Saitama 361-8505

[2] Faculty of Engineering, Tokai University, Hirastuka-city, Kanagawa 259-1292

来源：

Journal of the Vacuum Society of Japan | 2012年 / 55卷 / 08期

关键词：

Plasma applications - Biomedical equipment - Oxygen - Liquid crystal displays - Quartz crystal microbalances;

D O I：

10.3131/jvsj2.55.371

中图分类号：

学科分类号：

摘要：

Active oxygen has strong oxidative ability. Therefore, it can be used for surface treatment processing, e.g., cleaning of Liquid Crystal Display (LCD) glass, ashing for resist materials, and sterilization for medical devices. Nevertheless, effects of active oxygen on the surface have not been fully determined, especially in industrial processing. We have been investigating a new method for monitoring active oxygen with the quartz crystal microbalance (QCM) method for practical industrial uses. We review a principle of active oxygen monitoring using QCM and an instance of active oxygen monitoring for plasma treatment processes.

引用

页码：371 / 376

页数：5

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