Growth and properties of pulsed laser deposited K3Li2Nb5O15 thin films

被引：0

作者：

Zhan, Zusheng ^{[1
]}

Gong, Yansheng ^{[1
,2
]}

Shen, Qiang ^{[1
]}

Zhang, Lianmeng ^{[1
]}

机构：

[1] State Key Lab. of Advanced Technology for Material Synthesis and Processing, Wuhan University of Technology, Wuhan

[2] School of Materials Science and Chemical Engineering, China University of Geosciences, Hubei

来源：

Key Engineering Materials | 2007年 / 351卷

关键词：

Potassium lithium niobate films; Pulsed laser deposition (PLD); Raman scattering; Transmittance; X-ray diffraction;

D O I：

10.4028/0-87849-451-0.184

中图分类号：

学科分类号：

摘要：

Potassium lithium niobate (KLN: K3Li2Nb5O15) films have been deposited on quartz glass by Pulsed laser deposition (PLD) technique using a stoichiometric KLN target as starting materials. By investigating the effects of both the oxygen pressure and the substrate temperature on the structure of KLN films, optimum parameters have been identified for the growth of high-quality KLN films. At 10Pa oxygen ambient pressure, tetragonal tungsten-bronze-type structure of KLN films with (310) preferred orientation can be achieved at substrate temperatures in the range of 700-800°C Optical studies indicate that the films are highly transparent in the visible-near-infrared wavelength range.

引用

页码：184 / 188

页数：4

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