Thermal stability and high-temperature tribological properties of a-C:H and Si-DLC deposited by microwave sheath voltage combination plasma

被引：21

作者：

机构：

[1] Department of Mechanical Science and Engineering, Graduate School of Engineering, Nagoya University, Chikusa-ku, Nagoya 464-8601, Furo-cho

来源：

Deng, X. (deng@ume.mech.nagoya-u.ac.jp) | 1600年 / Japanese Society of Tribologists卷 / 08期

关键词：

Diamond-like carbon; In situ high-temperature tribological properties; Microwave sheath voltage combination plasma; Thermal stability;

D O I：

10.2474/trol.8.257

中图分类号：

学科分类号：

摘要：

In this study, amorphous hydrogenated carbon (a-C:H) and Si-doped diamond-like carbon (Si-DLC) films were prepared using microwave sheath voltage combination plasma (MVP) deposition. The thermal stability of the a-C:H and Si-DLC films were investigated by performing an annealing test (100-700°C) in ambient air. Furthermore, the in situ high-temperature tribological properties on the films were investigated by performing a sliding test against a Si3N4 ball at high temperatures (100, 200, and 300°C). Hardness measurements and a tribological test showed that Si-DLC has better thermal stability than a-C:H; however, Si-DLC has a higher friction coefficient and undergoes more wear than does a-C:H in the in situ high-temperature tribological test. Therefore, the failure of Si-DLC is due to adhesive wear, whereas that of a-C:H is due to abrasive wear. Copyright © 2013 Japanese Society of Tribologists.

引用

页码：257 / 264

页数：7

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