Influence of buffer layer on adhesion of 1064 nm, 532 nm frequency-doubled antireflection coating to LBO crystal

被引：0

作者：

Tan, Tianya ^{[1
,2
]}

Wu, Wei ^{[1
,2
]}

Guo, Yongxin ^{[1
,2
]}

Shao, Jianda ^{[3
]}

Fan, Zhengxiu ^{[3
]}

机构：

[1] Department of Physics, Liaoning University, Shenyang 110036, China

[2] Shenyang Key Laboratory of Photoelectronic Devices and Detection Technology, Shenyang 110036, China

[3] Research and Development Center for Optical Thin Film Coatings, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, P.O. Box 800-211, Shanghai 201800, China

来源：

Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams | 2009年 / 21卷 / 09期

关键词：

Compendex;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Adhesion

引用

页码：1343 / 1346