Electrochemical corrosion behavior of MSIP Ni coating on depleted uranium surface

被引:0
|
作者
Chen, Lin [1 ]
Li, Ke-Xue [1 ]
Wang, Qing-Fu [1 ]
Wang, Xiao-Hong [1 ]
Guan, Wei-Jun [1 ]
机构
[1] China Academy of Engineering Physics, Mianyang,621900, China
关键词
Corrosive effects - Electrochemical corrosion - Corrosion resistant coatings - Ion implantation - Chlorine compounds - Uranium - Potassium compounds - Magnetron sputtering;
D O I
10.7538/yzk.2014.48.11.1938
中图分类号
学科分类号
摘要
The Ni film was prepared by magnetron sputtering ion plating to improve the corrosion resistance of depleted uranium. The corrosion resistance of the Ni film was examined by electrochemical corrosion station. The results show that the Ni film corrosion potential is -100.8 mV, whereas it is -641.2 mV for depleted uranium in 50 μg/g KCl solution. The Ni film is a barrier to protect the depleted uranium substrate avoiding the corrosive media attack. The Ni film polarization resistance and impedance are much higher, while the corrosion current density is much lower contrast with depleted uranium. None crack or flake is found through 70 h corrosion. The corrosion resistance and corrosion current keep stable. It is indicated that the corrosion resistance of depleted uranium is effectively improved after deposited Ni film by magnetron sputtering ion plating. ©, 2014, Yuanzineng Kexue Jishu/Atomic Energy Science and Technology. All right reserved.
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页码:1938 / 1942
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