Design and fabrication of 650 nm arrayed waveguide grating

被引:0
作者
Han, Chao [1 ]
Yue, Yuanbin [1 ]
Zhao, Shimin [1 ]
Chen, Changming [1 ]
Zhang, Daming [1 ]
机构
[1] State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, Changchun, Jilin 130012, China
来源
Guangxue Xuebao/Acta Optica Sinica | 2013年 / 33卷 / 03期
关键词
Arrayed waveguide gratings - Multiplexing equipment - Plastic optical fibers - Light - Optical fiber fabrication - Inductively coupled plasma - Polymethyl methacrylates;
D O I
10.3788/AOS201333.0323002
中图分类号
学科分类号
摘要
Because the last kilometer problem of the optical communication network is expected to be solved by the 650 nm polymer optical fiber system, a 16×16 channel polymer array waveguide grating (AWG) wavelength division multiplexer is successfully fabricated to match the system. The design of the device is chosen as rectangular waveguide structure, while the refractive indices of the core layer and cladding layer are selected as 1.4888 and 1.482, respectively. By OptiBPM software, it is obtained that the channel insert loss is from 2.3 dB to 5.1 dB, the crosstalk level is -24 dB, and the channel spacing is 1.6 nm. For the fabrication of device, the polymethyl methacrylate (PMMA) material is choosed which is synthesized in our laboratory. By the ultraviolet (UV) lithography and inductively coupled plasma (ICP) etching process, a fine waveguide morphology is obtained, and finally the sample's area is 4 cm×3 cm. The polymer optical fiber (POF) is used to couple the 650 nm visible light into AWG device for testing and excellent multiplexing/de-multiplexing performances are achieved. The AWG wavelength division multiplexer in red-light wave band will play an important role in the future optical communication.
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