共 32 条
- [1] (2007)
- [2] Lugscheider E., Ceramic thermal barrier coatings deposited with the electron beam-physical vapour deposition technique, Surf. Coat. Techn., 98, pp. 1221-1227, (1998)
- [3] Kelly P.J., Magnetron sputtering: a review of recent developments and applications, Vacuum., 56, pp. 159-172, (2000)
- [4] Davis K., “Material Review: Alumina (Al<sub>2</sub>O<sub>3</sub>)”, J. School Doctoral Stud. (European Union), pp. 109-114, (2010)
- [5] Kirill B.O.R.D.O., Horst-Günter Rubahn “Effect of Deposition Rate on Structure and Surface Morphology of Thin Evaporated Al Films on Dielectrics and Semiconductors”, Mater. Sci. (Medziagotyra), 18, 4, (2012)
- [6] Carter D., Walde H., (2002)
- [7] Cremer R., Wittahaut M., Feldhege M., Comparative characterization of alumina coatings deposited by RF, DC and pulsed reactive magnetron sputtering, Surface Coatings Techn., 120-121, pp. 213-218, (1999)
- [8] 1, pp. 1-794, (2001)
- [9] Frost H.J., Thompson C.V., Walton D.T., Simulation of thin film grain structures—I. Grain growth stagnation, Acta Metallurgica et Materialia, 38, pp. 1455-1462, (1990)
- [10] Khalifa O.R.M., pp. 1-13, (2015)