Thin-film transistors with polycrystalline silicon films prepared by two-step rapid thermal annealing

被引：0

作者：

Cheng, Huang-Chung ^{[1
]}

Huang, Chun-Yao ^{[1
]}

Wang, Fang-Shing ^{[1
]}

Lin, Kuen-Hsien ^{[1
]}

Tarntair, Fu-Gow ^{[1
]}

机构：

[1] Dept. Electronics Eng. Inst. E., Semiconductor Research Center, National Chiao-Tung University, 1001 Ta Hsueh Road, HsinChu 300, Taiwan

来源：

| 2000年 / JJAP, Tokyo卷 / 39期

关键词：

D O I：

10.1143/jjap.39.l19

中图分类号：

学科分类号：

摘要：

引用

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