Development of high accuracy spray coating method using multi-layer coat

被引：0

作者：

Akamatsu, Mikio ^{[1
]}

Terao, Kyohei ^{[1
]}

Takao, Hidekuni ^{[1
]}

Simokawa, Fusao ^{[1
]}

Oohira, Fumikazu ^{[1
]}

Suzuki, Takaaki ^{[1
]}

机构：

[1] Faculty of Engineering, Kagawa University, Takamatsu, Kagawa 761-0396, 2217-20, Hayashi-cho

来源：

IEEJ Transactions on Sensors and Micromachines | 2013年 / 133卷 / 05期

基金：

日本学术振兴会;

关键词：

Multi-layered coating; Photoresist; Spray coat; SU-8;

D O I：

10.1541/ieejsmas.133.170

中图分类号：

学科分类号：

摘要：

In this paper, we propose a high-accuracy spray coating method for obtaining the thick photoresist over 200μm. A multi-layered coating method with thin photoresist layers is applied in order to achieve a thick photoresist. We evaluated the waviness and the reproducibility of the thickness of the photoresist coated on a flat substrate. The multi-layered spray coating method with the edge cover achieves high accuracy thickness of the photoresist with covering wide-range of the target thickness. © 2013 The Institute of Electrical Engineers of Japan.

引用

页码：170 / 176+7

共 14 条

[1]

Suzuki H., Hiramaru D., Terao K., Takao H., Oohira F., Kotera H., Suzuki T., A high-throughput FISH microchip for clinical genetics, Proc. 14th Int. Conf. on Miniaturized Syst. Chem. Life Sci., pp. 702-704, (2010)

[2]

Yoon Y.K., Park J.H., Cros F., Allen M.G., Integrated vertical screen microfilter system using inclined SU-8 structures, Proc. IEEE 16th Int. Conf. on Micro Electromech. Syst., pp. 227-230, (2003)

[3]

Ezkerra A., Fernandez L., Mayora K., Lopez J., A microvalve for lab-on-A-chip applications based on electrochemically actuated SU-8 cantilevers, Sens. Actuators B, 155, pp. 501-511, (2011)

[4]

Kubenz M., Ostrzinski U., Reuther F., Gruetzner G., Effective baking of thick and ultra-thick photoresist layers by infrared radiation, Microelectron. Eng., 6768, pp. 495-501, (2003)

[5]

Tseng F.-G., Yu C.-S., High aspect ratio ultrathick micro-stencil by JSR THB-430N negative UV photoresist, Sensors and Actuators, A: Physical, 97-98, pp. 764-770, (2002)

[6]

Lin C., Lee G., Chang B., Chang G., A new fabrication process for ultra-thick microfluidic microstructures utilizing SU-8 photoresist, J. Micromech. Microeng., 12, pp. 590-597, (2002)

[7]

Shaw M., Nawrocki D., Hurditch R., Johnson D., Improving the process capability of SU-8, Microsyst. Technol., 10, pp. 1-6, (2003)

[8]

Yang R., Wang W., A numerical and experimental study on gap compensation and wavelength selection in UV-lithography of ultra-high aspect ratio SU-8 microstructures, Sensors and Actuators, B: Chemical, 110, 2, pp. 279-288, (2005)

[9]

Singh V.K., Sasaki M., Song J.H., Hane K., Technique for preparing defect-free spray coated resist film on three-dimensional micro-electromechanical systems, Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 44, 4 A, pp. 2016-2020, (2005)

[10]

Sasaki M., Hisayoshi T., Fukuda N., Kumagai S., Uniformity improvement of thickness distribution of spray coated film based on gas flow analysis, Proc. of 27th Sensor Symposium, pp. 72-75, (2010)

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