Novel type of arc source with rotating transverse magnetic field in arc ion plating

被引：0
作者：
Zhao, Yanhui [1 ]
Lang, Wenchang [2 ]
Xiao, Jinquan [1 ]
Gong, Jun [1 ]
Sun, Chao [1 ]
机构：
[1] Division of Surface Engineering of Materials, Institute of Metal Research, Chinese Academy of Sciences
[2] Key Lab. of Material Processing and Mould Technology, Wenzhou Vocational and Technical College
来源：
Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology | 2013年 / 33卷 / 04期
关键词：
Arc ion plating; Arc source design; Macroparticle pollution; Rotating transverse magnetic field;
D O I：
10.3969/j.issn.1672-7126.2013.04.18
中图分类号：
学科分类号：
摘要：
A noveltype of arc source with rotating transverse magnetic field was developed to solve the problem of micro-particle contamination, originated from arc evaporation, in the film deposition by arc ion plating. With the newly-developed arc source, the arc spot easily covers the entire target surface, and its movement is well controlled by adjusting the frequency and intensity of the rotating transverse magnetic field. The magnetic field distribution was simulated in finite element method to optimize the arc source design. The novel arc source is capable of working in multi-mode with adjustable amplitude and frequency to meet the requirement of a wide range of applications. Besides, its many advantages over the conventional arc source include the reduction of particle emission, enhancement of film quality, and improvement of arc discharge, target utilization, and target-etching uniformity.
引用
收藏
页码：387 / 391
页数：4
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