Fabrication of metal micro-grating with high aspect ratio on metal substrate

被引：1
作者：
Du, Li-Qun [1 ,2 ]
Bao, Qi-Lei [2 ]
Zhao, Ming [2 ]
Wang, Ao-An [2 ]
机构：
[1] Key Laboratory for Precision and Non-Traditional Machining Technology of the Ministry of Education, Dalian University of Technology, Dalian
[2] Key Laboratory for Micro/Nano Technology and System of Liaoning Province, Dalian University of Technology, Dalian
来源：
Guangxue Jingmi Gongcheng/Optics and Precision Engineering | 2015年 / 23卷 / 03期
关键词：
High aspect ratio; Metal micro-grating; Micro electroforming; SU-8 thick photoresist; UV-LIGA technology;
D O I：
10.3788/OPE.20152303.0700
中图分类号：
学科分类号：
摘要：
According to the requirements of optical fields for metal micro devices with higher aspect ratios, a metal micro-grating with the high aspect ratio was fabricated on a metal substrate by using the UV-LIGA technology. The “exposure step by step” and “development once” were used to fabricate a SU-8 thick photoresist mold with high aspect ratio to overcome the technologic difficulty in fabrication processing. For the defects of electroforming layer caused by long operation time, the fractional electroforming and other methods were adopted to obtain the electroforming grating structure.. At the same time, the line width compensation method was taken to solve the problem that line width of SU-8 photoresist mold was reduced by swelling. In the process of stripping photoresist after electroforming, the ultrasonic method and soaked method were alternately used. Finally, the metal micro-grating with a period of 130 μm, and a size of 900 μm×65 μm×243 μm was fabricated. The high aspect ratio of the metal micro-grating reaches 5, and its relative error on overall dimensions is lower than 1%. Moreover, the surface roughness of metal micro-grating is lower than 6.17 nm. This research breaks the height limitation and substrate fragile of the exciting fabrication methods for metal micro-gratings with high aspect ratios. ©, 2015, Chinese Academy of Sciences. All right reserved.
引用
收藏
页码：700 / 707
页数：7
相关论文
共 14 条
  • [1] Wang Z.Q., The Design and Fabrication of Single-order Diffraction Grating, (2013)
  • [2] Zhuo L.X., Tang W., Dai Y., Et al., Influence of sub-wavelength aluminum grating's film thickness on infrared reflectivity, Proceedings of the 7th China Functional Materials and Applications of Academic (volume 2), pp. 296-298, (2010)
  • [3] Zheng G.G., Chen Y.Y., Xu L.H., Et al., Fabrication and application of high aspect ratio metallic gratings for sensing in the mid-infrared region, Journal of Infrared and Millimeter Waves, 32, 2, pp. 154-159, (2013)
  • [4] Li Ch.B., Process Study of Metal Micro Devices Fabricated by Copper or Nickel Electroforming, (2013)
  • [5] Du L.Q., Li Ch.B., Li Y.H., Et al., Application of ultrasonic stress relief technology to microinjection mold fabrication, Opt. Precision Eng., 20, 6, pp. 1250-1256, (2012)
  • [6] Wourters K., Puers R., Diffusing and swelling in SU-8: insight in material properties and processing, J. Micromech. Microeng, 20, 9, pp. 1-10, (2010)
  • [7] Jin P., Jiang K., Sun N.J., Micro fabrication of ultra-thick SU-8 photoresist for micro engines, Micromachining and Microfabrication, pp. 105-110, (2003)
  • [8] Du L.Q., Zhu Sh.M., Liu Ch., Study on the thermal swelling of SU-8 photoresist in UV-LIGA technique, Piezoelectrics and Acoustooptics, 30, 5, pp. 621-623, (2008)
  • [9] Du L.Q., Liu Y.P., Li Y.H., Et al., Effect of ultrasonic treatment on SU-8 swelling in UV-LIGA technology, Opt. Precision Eng., 20, 9, pp. 2006-2013, (2012)
  • [10] Du L.Q., Zhu S.H.M., Yu L.Ch., Effect of post exposure bake temperature on thermal swelling of SU-8 photoresist, Opt. Precision Eng., 16, 3, pp. 500-504, (2008)
12