In situ observation of etching profile in inductively coupled plasma etching of GaAs and InP using long distance microscope

被引：0
|
作者：
Matsutani, Akihiro [1 ]
Ohtsuki, Hideo [2 ]
Koyama, Fumio [1 ]
机构：
[1] Precision and Intelligence Lab., Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
[2] Samco International Inc., 36 Waraya-Cho, Takeda, Fujimi-ku, Kyoto 612-8443, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2003年 / 42卷 / 2 A期
关键词：
Long distance microscope - Real time control;
D O I：
10.1143/jjap.42.426
中图分类号：
学科分类号：
摘要：
引用
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页码：426 / 427
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