In situ observation of etching profile in inductively coupled plasma etching of GaAs and InP using long distance microscope

被引:0
|
作者
Matsutani, Akihiro [1 ]
Ohtsuki, Hideo [2 ]
Koyama, Fumio [1 ]
机构
[1] Precision and Intelligence Lab., Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
[2] Samco International Inc., 36 Waraya-Cho, Takeda, Fujimi-ku, Kyoto 612-8443, Japan
来源
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2003年 / 42卷 / 2 A期
关键词
Long distance microscope - Real time control;
D O I
10.1143/jjap.42.426
中图分类号
学科分类号
摘要
引用
收藏
页码:426 / 427
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