Microstructure of amorphous copper-carbon thin films formed by plasma-enhanced chemical vapor deposition

被引：0

作者：

Astashynskaya M.V. ^{[1
]}

Astashynski V.V. ^{[1
]}

Kvasov N.T. ^{[1
]}

Uglov V.V. ^{[2
]}

机构：

[1] Research Laboratory, Department of Solid State Physics, Belarusian State University, 4 Nezavisimost Ave., Minsk

[2] Tomsk Polytechnic University, 2a Lenin Ave., Tomsk

来源：

High Temperature Material Processes | 2016年 / 20卷 / 02期

基金：

俄罗斯科学基金会;

关键词：

Cu/a–C:H composite thin films; Microstructure; Nanoclusters; Plasmaenhanced chemical vapor deposition;

D O I：

10.1615/HighTempMatProc.2016017797

中图分类号：

学科分类号：

摘要：

The microstructure of copper-carbon Cu/a–C:H nanocomposites formed by plasma-enhanced chemical vapor deposition has been determined by transmission electron microscopy. The formation of spherical copper inclusions embedded in the matrix of amorphous carbon was observed. The average size of the copper inclusions decreases from 16 to 5 nm on increasing the carbon concentration from 8 to 75 at.%. A description of the copper clusters formation processes in the reactor chamber was proposed. The results of calculation of the average size of copper clusters are in good agreement with the observed size of the copper inclusions formed in nanocomposite thin films. © 2016 by Begell House, Inc.

引用

页码：115 / 126

页数：11

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