Polishing of B-doped diamond films by electrical discharge machining

被引：0
|
作者：
Chu X. [1 ]
Zuo D. [2 ]
机构：
[1] Institute of Vacuum Sci-Tech and Equipment, Hefei University of Technology
[2] College of Mechanical and Electrical Engineering, Nanjing University of Aeronautics and Astronautics
来源：
Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology | 2011年 / 31卷 / 03期
关键词：
B-doped; Diamond film; Electrical discharge machining polishing; Regression analysis;
D O I：
10.3969/j.issn.1672-7126.2011.03.08
中图分类号：
学科分类号：
摘要：
A novel technique was developed to polish the boron-doped diamond films, grown by chemical vapor deposition. The newly-developed, electrical discharge machining polishing technique involves various processes, such as the melting, vaporization, oxidation, and graphitization of diamond grains, chemical reaction at the interface. The impacts of the polishing conditions on the surface microstructures and contents were studied. The results show that the discharge current and the pulse width significantly affect the polishing. For instance, under optimized polishing conditions: at a discharge current of 5 A, a pulse width of 380 μs, the electrical discharge machining polishing is capable of reducing the surface roughness of the diamond films to less than 1 μm.
引用
收藏
页码：287 / 291
页数：4
相关论文
共 12 条
  • [1] Gicquel A., Hassouni K., Silva F., Et al., CVD diamond films: from growth to applications, Current Applied Physics, 6, pp. 479-496, (2001)
  • [2] Guo Z.N., Wang C.Y., Kuang T.C., Investigation into polishing process of CVD diamond films, Materials and Manufacturing Processes, 17, 1, pp. 45-55, (2002)
  • [3] 30, 1, pp. 72-75, (2010)
  • [4] 29, 5, pp. 531-535, (2009)
  • [5] Cheng C.Y., Tsai H.Y., Wu C.H., Et al., An oxidation enhanced mechanical polishing technique for CVD diamond films, Diamond and Related Materials, 14, 3-7, pp. 622-625, (2005)
  • [6] Sun Y., Wang S., Tian S., Et al., Polishing of diamond thick films by Ce at lower temperatures, Diamond and Related Materials, 15, 9, pp. 1412-1417, (2006)
  • [7] Tsai H.Y., Ting C.J., Chou C.P., Evaluation research of polishing methods for large area diamond films produced by chemical vapor deposition, Diamond and Related Materials, 16, 2, pp. 253-261, (2007)
  • [8] Wang C.Y., Zhang F.L., Kuang T.C., Et al., Chemical/mechanical polishing of diamond films assisted by molten mixture of LiNO<sub>3</sub> and KNO<sub>3</sub>, Thin Solid Films, 496, 2, pp. 698-702, (2006)
  • [9] Wang S., Sun Y., Tian S., Surface graphitization analysis of cerium-polished HFCVD diamond films with micro-raman spectra, Journal of Rare Earths, 26, 3, pp. 362-366, (2008)
  • [10] Chen Y., Zhang L.C., Polishing of polycrystalline diamond by the technique of dynamic friction, part 4: establishing the polishing map, International Journal of Machine Tools and Manufacture, International Journal of Machine Tools and Manufacture, 49, 3-4, pp. 309-314, (2009)
12