Study on Film Thickness Uniformity of Magnetron Sputtering System Based on Twin Target

被引：0

作者：

Wei B. ^{[1
]}

Liu D. ^{[1
]}

Fu X. ^{[1
]}

Zhang J. ^{[1
]}

Wang Y. ^{[1
]}

Geng Y. ^{[2
]}

机构：

[1] School of Opto-Electronic Engineering, Changchun University of Science and Technology, Jilin

[2] Optorun (Shanghai) Co., Ltd., Shanghai

来源：

Guangxue Xuebao/Acta Optica Sinica | 2021年 / 41卷 / 07期

关键词：

Binary gradient inflation mode; Magnetron sputtering; Plasma density; Sine half-wave; Thickness uniformity; Thin films; Twin target;

D O I：

10.3788/AOS202141.0731001

中图分类号：

学科分类号：

摘要：

Film thickness uniformity in a magnetron sputtering system is one of the key indicators. The effects of magnetic field intensity, distance between target and substrate and gas pressure on the thickness uniformity of Si3N4 and SiO2 films are analyzed. The plasma density is analyzed by using Langmuir probe, and the longitudinal uniformity is adjusted by binary gradient inflation mode. By loading sine half-wave voltage to the target and using MATLAB software to determine the amplitude and phase parameters, so as to adjust the uniformity of the transverse. The experiment results show that for the Si3N4 film, the transverse uniformity is ±1.27%, ±0.62%, and ±1.33% respectively at the top, middle, and bottom, and the longitudinal uniformity is ±0.33%. For the SiO2 film, the transverse uniformity is ±1.12%, ±0.42%, and ±1.23% respectively at the top, middle, and bottom, and the longitudinal uniformity is ±0.25%. © 2021, Chinese Lasers Press. All right reserved.

引用

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