Surface treatment by Ar plasma irradiation in electron cyclotron resonance chemical vapor deposition

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作者：
Hashimoto, Jun-Ichi [1 ]
Ikoma, Nobuyuki [1 ]
Murata, Michio [1 ]
Fukui, Jiro [1 ]
Nomaguchi, Toshio [1 ]
Katsuyama, Tsukuru [1 ]
机构：
[1] Optoelectronics R. and D. Labs., Sumitomo Electric Industries Ltd., 1 Taya-cho, Sakae-ku, Yokohama 244-8588, Japan
来源：
| 1600年 / JJAP, Tokyo, Japan卷 / 39期
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