Solution processed single-grain Si TFTs on a plastic substrate

被引:0
作者
Ishihara, Ryoichi [1 ,3 ]
Zhang, Jin [1 ]
Zwan, Michiel V. D. [1 ]
Trifunovic, Miki [1 ]
Takagishi, Hideyuki [2 ]
Shimoda, Tatsuya [2 ,3 ]
机构
[1] Delft Univ. of Technol., Delft
[2] JST ERATO, Shimoda Nano-Liquid Process Project, Ishikawa
[3] Sch. of Mat. Sci., Japan Advanced Institute of Sci. and Technol. (JAIST), Ishikawa
来源
Digest of Technical Papers - SID International Symposium | 2014年 / 45卷 / 01期
关键词
excimer-laser; liquid-Si; poly-Si; solution process; TFTs;
D O I
10.1002/j.2168-0159.2014.tb00118.x
中图分类号
学科分类号
摘要
High-mobility single-grain Si TFTs have been successfully fabricated on a polyimide-coated substrate with solution process of Si. After doctor-blade coating of cyclopentasilane (CPS), a-Si:H was obtained at a temperature below 350°C. With dehydrogenation and crystallization by excimer laser, grains with a maximum diameter of 3 μm were obtained at predetermined positions. Single-grain Si TFTs showed mobilities of 460cm2/Vs and 121cm 2/Vs for electrons and holes, respectively. The devices were transferred onto a PEN foil and operated under a bending diameter as small as 6 mm. The results suggest the proposed technology to be attractive for various innovative applications, not only for driver-integrated flexible displays, but also for ultra-high-frequency RF-ID tag, highly-sensitive bio-medical sensors and eventually for integrated smart-systems on a plastic. © 2014 Society for Information Display.
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页码:439 / 442
页数:3
相关论文
共 7 条
[1]  
Sekitani T., Zschieschang U., Klauk H., Someya T., Flexible organic transistors and circuits with extreme bending stability, Nature Materials, 9, pp. 1015-1022, (2010)
[2]  
Germs W.C., Adriaans W.H., Tripathi A.K., Roelofs W.S.C., Cobb B., Janssen R.A.J., Gelinck G.H., Kemerink M., Charge transport in amorphous InGaZnO thin film transistors, Physical Review, 86, pp. 1553191-1553198, (2012)
[3]  
Shimoda T., Matsuki Y., Furusawa M., Aoki T., Yudasaka I., Tanaka H., Iwasawa H., Wang D., Miyasaka M., Takeuchi Y., Solution-processed silicon films and transistors, Nature, 440, 6, pp. 783-786, (2006)
[4]  
Van Der Wilt P.Ch., Van Dijk B.D., Bertens G.J., Ishihara R., Beenakker C.I.M., Formation of location-controlled crystalline islands using substrate-embedded-seeds in excimer-laser crystallization of silicon films, Appl. Phys. Lett., 72, 12, pp. 1819-1821, (2001)
[5]  
Ishihara R., Van Der Wilt P.Ch., Van Dijk B.D., Burtsev A., Voogt F.C., Bertens G.J., Metselaar J.W., Beenakker C.I.M., Advanced excimer-laser crystallization techniques of Si thin-film for location control of large grain on glass, Flat Panel Display Technology and Display Metrology II, 4295, pp. 14-23, (2001)
[6]  
Ishihara R., Derakhshandeh J., Mofrad M.R.T., Chen T., Golshani N., Beenakker M.C.I., Monolithic 3D-ICs with single grain Si thin film transistors, SolidState Electronics, 71, (2012)
[7]  
Yoon S.Y., Young N., Van Der Zaag P.J., McCulloch D., High-performance poly-Si TFTs made by Ni-mediated crystallization through low-shot laser annealing, IEEE Electron Device Letters, 24, pp. 22-24, (2003)