A comparative study of wet etching and contacts on (2¯01) and (010) oriented β-Ga2O3

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机构：

[1] Jang, Soohwan

[2] Jung, Sunwoo

[3] Beers, Kimberly

[4] Yang, Jiancheng

[5] Ren, Fan

[6] Kuramata, A.

[7] Pearton, S.J.

[8] Baik, Kwang Hyeon

来源：

Baik, Kwang Hyeon (khbaik@hongik.ac.kr) | 1600年 / Elsevier Ltd卷 / 731期

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Number: -, Acronym: DOD, Sponsor: U.S. Department of Defense, Number: HDTRA1-17-1-011, Acronym: DTRA, Sponsor: Defense Threat Reduction Agency, Number: -, Acronym: NEDO, Sponsor: New Energy and Industrial Technology Development Organization, Number: 2015R1D1A1A01058663,2017R1D1A3B03035420, Acronym: MOE, Sponsor: Ministry of Education, Number: 2015M3A7B7045185, Acronym: MSIP, Sponsor: Ministry of Science, ICT and Future Planning, Number: -, Acronym: NRF, Sponsor: National Research Foundation of Korea,;

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