Effect of preparation process on roughness of self-supporting film

被引：0

作者：

Zheng, Rui-Ting ^{[1
]}

Gao, Feng-Ju ^{[1
]}

Yu, Jing ^{[1
]}

Cheng, Guo-An ^{[1
]}

机构：

[1] Beijing Normal University, Beijing 100875, China

来源：

Yuanzineng Kexue Jishu/Atomic Energy Science and Technology | 2008年 / 42卷 / 10期

关键词：

Vacuum applications - Silicon nitride - Vacuum technology - Sodium chloride - Field emission microscopes - Potassium - Deposition - Film preparation - Sugar (sucrose) - Atomic force microscopy - Metal substrates - Scanning electron microscopy;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Metal vapor vacuum arc ion deposition system was adapted to prepare self-supporting Ni films on substrates of betaine-sucrose/Si, potassium oleate/Si, potassium oleate-sucrose/Si, self-supporting collodion film, polished NaCl and self-supporting SiN film, respectively. Field emission scanning electron microscopy (FESEM) and atomic force microscope (AFM) were employed to analyze the surface morphology and roughness of the films and substrates. The result indicates that the mean roughness of the self-supporting Ni film depends on its depositing substrate. Glancing angle deposition can reduce the surface roughness of film. Self-supporting Ni film with the 1.5 nm mean surface roughness was obtained on self-supporting collodion film with 60 glancing angle.

引用

页码：938 / 943