Effects of Al concentrations on the microstructure and mechanical properties of Ti-Al-N films deposited by RF-ICPIS enhanced magnetron sputtering

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[1] Li, Dongke
[2] 1,Chen, Junfang
[3] Zou, Changwei
[4] Ma, Junhui
[5] Li, Pengfei
[6] Li, Ye
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Chen, J. (chenjf@scnu.edu.com) | 1600年 / Elsevier Ltd卷 / 609期
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