Force nanolithography on various surfaces by atomic force microscope

被引：0
|
作者：
Hassani S.S. [1 ]
Sobat Z. [1 ]
Aghabozorg H.R. [1 ]
机构：
[1] Catalysis Research Center, Research Institute of Petroleum Industry, 18745-4163, Tehran
来源：
International Journal of Nanomanufacturing | 2010年 / 5卷 / 3-4期
关键词：
AFM; Atomic force microscopy; Force lithography; Nanolithography; Nanopatterning; Scanning probe lithography; SPL;
D O I：
10.1504/IJNM.2010.033863
中图分类号：
学科分类号：
摘要：
The atomic force microscope (AFM) has become an increasing popular tool for characterising and manipulating surfaces and thin films of many different types of materials. In this work, nanolithography on surface of different substrates was studied by AFM. The scratches on poly methyl methacrylate (PMMA) coated on silicon and glass, highly-oriented pyrolytic graphite (HOPG) and polyethylene (PE) were made using contact mode and silicon and diamond tips. The normal force between the tips and the desired samples was estimated from cantilever deflection curve plotted against Z-displacement of the cantilever. This curve was converted to force-distance curve by using Hook's law. Effects of applied normal force on the geometry and depth of the scratches were studied. This study shows that there is a critical tip force to remove material from various surfaces. Copyright © 2010 Inderscience Enterprises Ltd.
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页码：217 / 224
页数：7
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