Fabrication and Low Range Pressure Sensor Application of Polyimide Based Cr-N Thin Film Strain Gauge Element

被引：0
作者：
Sasaki, Yoshihiro [1 ]
Niwa, Eiji [1 ]
机构：
[1] Research Institute for Electromagnetic Materials, 9-5-1, Narita, Miyagi, Tomiya
来源：
IEEJ Transactions on Sensors and Micromachines | 2024年 / 144卷 / 11期
关键词：
Cr-N; polyimide; pressure sensor; strain gauge; strain sensitive thin film;
D O I：
10.1541/ieejsmas.144.375
中图分类号：
学科分类号：
摘要：
We have developed a Cr-N alloy thin film showing a gauge factor (Gf) of about 10 and a temperature coefficient of resistivity (TCR) of about zero, which is expected as a new strain gauge material in the next generation. In this study, we have investigated the fabrication of polyimide-based Cr-N thin films and the pressure sensor application for very low pressure range using the films. We have found out that the usable crack free Cr-N thin films were obtained on polyimide bases due to using the lower spattering gas pressure, and also enabled to detect the very low range pressure of 1-30kPa sensitively. © 2024 The Institute of Electrical Engineers of Japan.
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页码：375 / 383
页数：8
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