Application of atomic layer deposition in new generations of solar cells

被引：0
作者：
Hu H. [1 ,2 ,3 ]
Dong B. [1 ,2 ,3 ]
Wan L. [1 ,2 ,3 ]
Kong M. [1 ,2 ,3 ]
Zhao L. [1 ,2 ,3 ]
Wang E. [1 ,2 ,3 ]
Wang S. [1 ,2 ,3 ]
机构：
[1] Hubei Collaborative Innovation Center for Advanced Organic Chemical Materials, Hubei University, Wuhan
[2] Key Laboratory for the Green Preparation and Application of Functional Materials, Ministry of Education, Hubei University, Wuhan
[3] Faculty of Materials Science and Engineering, Hubei University, Wuhan
来源：
Cailiao Daobao/Materials Review | 2016年 / 30卷 / 12期
关键词：
Atomic layer deposition; Dye-sensitized solar cells; Functional nanofilms; Perovskite solar cells;
D O I：
10.11896/j.issn.1005-023X.2016.23.002
中图分类号：
学科分类号：
摘要：
Atomic layer deposition (ALD), as an important and developing process for the fabrication of novel structures, demonstrates peculiar advantages in the preparation of nanostructures and composite nanostructures, and promises great potential and prospects in new thin-film solar cells. In the review, the applications of ALD technology in silicon-based solar cells and copper indium gallium selenide (CIGS) type film solar cells are briefly introduced after describing the working principle of ALD, and then the utilization of ALD-fabricated functional nanofilms in new thin-film solar cells represented by dye-sensitized solar cells (DSSCs) and perovskite solar cells (PSCs) is empathetically elaborated. At last, the characteristics and advantages of functional nanofilms fabricated by ALD technology are summarized, and the application potential and tendency of ALD technology in new energy material and devices are prospected. © 2016, Materials Review Magazine. All right reserved.
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页码：9 / 18
页数：9
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