Photoabsorption of synthetic silica glass under ArF excimer laser irradiation

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作者：
机构：
[1] Shimbo, Masaru
[2] Nakajima, Toshio
[3] Tsuji, Naoki
[4] Kakuno, Tsutomu
[5] Obara, Takashi
来源：
Shimbo, M. | 2001年 / Japan Society of Applied Physics卷 / 40期
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D O I：
10.1143/jjap.40.5962
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