Microscale wear properties of ultrathin diamond-like carbon films

被引：0
|
作者：
Shimura, Ken-ichi [1 ]
Baba, Kazuhiro [1 ]
机构：
[1] NEC Corp, Kanagawa, Japan
来源：
| 2000年 / JJAP, Tokyo卷 / 39期
关键词：
Atomic force microscopy - Carbon - Electric potential - Interdiffusion (solids) - Plasma enhanced chemical vapor deposition - Silicon - Tribology - Ultrathin films - Wear resistance;
D O I：
10.1143/jjap.39.l626
中图分类号：
学科分类号：
摘要：
Microscale wear properties of ultrathin diamond-like carbon (DLC) films grown by rf plasma-enhanced chemical vapor deposition were investigated using an atomic force microscope. It was revealed that a low wear-resistant layer, which contained a larger sp2 component, existed on the surface of the films. The thickness of the layer depended on the self-bias voltage during deposition. The intermixing of carbon and silicon atoms at the interface between the DLC and the substrate was found to affect the surface wear resistance of ultrathin DLC films.
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