Simulation study of the removal of NO from N2/NO mixture by pulsed dielectric-barrier discharge at atmospheric pressure

被引：0
|
作者：
Wang Y. [1 ]
Zhang R. [1 ]
Sun J. [1 ]
Zhang J. [1 ]
Wang Q. [1 ]
Wang D. [1 ]
机构：
[1] School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian
来源：
Gaodianya Jishu/High Voltage Engineering | 2016年 / 42卷 / 02期
基金：
中国国家自然科学基金;
关键词：
Atmospheric-pressure discharge; Dielectric barrier discharge; N[!sub]2[!/sub]/NO mixture; NO removal rate; One-dimensional fluid model; Pulsed voltage;
D O I：
10.13336/j.1003-6520.hve.2016.02.010
中图分类号：
学科分类号：
摘要：
NO is one of the important air pollutants. Based on one-dimension self-consistent fluid mode, the removal mechanism of NO from N2/NO mixture by pulsed dielectric-barrier discharge at atmospheric pressure was studied. The effects of the discharge parameters on NO removal rate were also investigated and discussed. Simulation results show that NO is removed mainly through the reaction N+NO→N2 +O. N atom is the main active species that removes the NO from N2/NO mixture. It comes from the two discharges occurring at the rising front and the falling front of applied voltage pulse, and it is mainly produced by the electron collision reaction with nitrogen which is the background gas. The NO removal rate depends on the concentration of N atom produced by pulsed dielectric barrier discharge (DBD)in N2/NO. The bigger the voltage amplitude, the shorter the rising and falling time, the thinner the dielectric layer, or the smaller the discharge gap, the higher the resultant N concentration and thus the higher the nitric oxide removal rate. When keeping other parameters unchanged, there exists an optimal voltage pulse width which results in the maximum NO removal rate. © 2016, High Voltage Engineering Editorial Department of CEPRI. All right reserved.
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收藏
页码：405 / 413
页数：8
相关论文
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