Growth behavior of hafnium oxide film by atomic layer deposition and its modulation

被引：0
|
作者：
Nie, Xianglong [1 ]
Ma, Dayan [1 ]
Xu, Kewei [1 ,2 ]
机构：
[1] State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an,710049, China
[2] Xi'an University of Arts and Science, Xi'an,710065, China
来源：
Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering | 2015年 / 44卷 / 11期
关键词：
Compendex;
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学科分类号：
摘要：
Atomic layer deposition
引用
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页码：2907 / 2912
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