NGL: Forever next-generation?

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作者
Hand, Aaron
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Bandwidth - Calcium compounds - Customer satisfaction - Industrial plants - Irradiation - Light sources - Lithography - Microprocessor chips - Printing - Production - Projection systems - Surface roughness;
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摘要
Various aspects of the next generation lithography (NGL) are discussed. The Semicondustor International has decided to conduct a survey of the needs and expectations for the NGL. There are about 10 machines worldwide using 193nm lithography in a production environment. The non optical techniques has viability for a given process node and the optical lithography has surprassed it in technical viability. It is found that maskless or e-beam lithography has slow down the volume production of semiconductors .
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页码:57 / 64
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