NGL: Forever next-generation?

被引：0
|
作者：
Hand, Aaron
机构：
来源：
Semiconductor International | 2002年 / 25卷 / 06期
关键词：
Bandwidth - Calcium compounds - Customer satisfaction - Industrial plants - Irradiation - Light sources - Lithography - Microprocessor chips - Printing - Production - Projection systems - Surface roughness;
D O I：
暂无
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学科分类号：
摘要：
Various aspects of the next generation lithography (NGL) are discussed. The Semicondustor International has decided to conduct a survey of the needs and expectations for the NGL. There are about 10 machines worldwide using 193nm lithography in a production environment. The non optical techniques has viability for a given process node and the optical lithography has surprassed it in technical viability. It is found that maskless or e-beam lithography has slow down the volume production of semiconductors .
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页码：57 / 64
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