Nanocrystalline Ti Films Deposited by Modulated Pulsed Power Magnetron Sputtering

被引：0

作者：

Yang, Chao ^{[1
]}

Jiang, Bailing ^{[1
]}

Wang, Di ^{[1
]}

Huang, Bei ^{[1
]}

Dong, Dan ^{[1
]}

机构：

[1] School of Materials Science and Engineering, Xi'an University of Technology, Xi'an,710048, China

来源：

Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering | 2019年 / 48卷 / 11期

关键词：

Ionization - Thin films - Nanocrystals;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Modulated pulsed power magnetron sputtering (MPPMS) has the ability to control the ionization rate, energy and quantity of deposited particles through adjusting the pulsed intensity and duration, thus modifying the nucleation and growth process of the thin film. Nanocrystalline Ti films were deposited using MPPMS technique in a closed field unbalanced magnetron sputtering (CFUBMS) system under different peak target power densities of the strong-ionized period (Pd). The modulated pulse power (MPP) was employed to modify the Pd by varying the pulse lengths and the average target powers. The results show that the nanocrystalline Ti film with a grain size of 11 nm exhibits a dense microstructure and a smooth surface (roughness of 11 nm) when the Pd is 0.86 kW•cm-2. The improved properties of the as-prepared Ti film were also discussed. Copyright © 2019, Northwest Institute for Nonferrous Metal Research. Published by Science Press. All rights reserved.

引用

页码：3433 / 3440