An in situ transmission electron microscope investigation into grain growth and ordering of sputter-deposited nanocrystalline Ni3Al thin films

被引：0
|
作者：
Ng, H.P. [1 ]
Ngan, A.H.W. [1 ]
机构：
[1] Lab. des Mat. et du Genie Physique, ENSPG-INPG UM 5628, BP 46, 38402, St. Martin d'Heres, France
来源：
| 2002年 / Materials Research Society卷 / 17期
关键词：
Arrhenius rate law - Grain coalescence - Isothermal heating - Nickel aluminide;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] PROPERTIES OF NB3AL THIN-FILMS SPUTTER-DEPOSITED ON SAPPHIRE SUBSTRATES
    TANABE, K
    MICHIKAMI, O
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1982, 21 (10): : 1427 - 1430
  • [22] PROPERTIES OF Nb3Al THIN FILMS SPUTTER-DEPOSITED ON SAPPHIRE SUBSTRATES.
    Tanabe, Keiichi
    Michikami, Osamu
    1600, (21):
  • [23] On an improved preparation method for Ni3Al specimens and its application to in situ straining in a transmission electron microscope
    Maurer, R., 1600, (23):
  • [24] Growth of sputter-deposited Ni-Ti thin films:: Effect of a SiO2 buffer layer
    Martins, RMS
    Schell, N
    Beckers, M
    Mahesh, KK
    Silva, RJC
    Fernandes, FMB
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2006, 84 (03): : 285 - 289
  • [25] Growth of sputter-deposited Ni-Ti thin films: Effect of a SiO2 buffer layer
    R.M.S. Martins
    N. Schell
    M. Beckers
    K.K. Mahesh
    R.J.C. Silva
    F.M.B. Fernandes
    Applied Physics A, 2006, 84 : 285 - 289
  • [26] In-Situ Transmission Electron Microscope High Temperature Behavior in Nanocrystalline Platinum Thin Films
    Garcia, Davil
    Leon, Alexander
    Kumar, Sandeep
    JOM, 2016, 68 (01) : 109 - 115
  • [27] In-Situ Transmission Electron Microscope High Temperature Behavior in Nanocrystalline Platinum Thin Films
    Davil Garcia
    Alexander Leon
    Sandeep Kumar
    JOM, 2016, 68 : 109 - 115
  • [28] Tunable optoelectronic properties of pulsed dc sputter-deposited ZnO:Al thin films: Role of growth angle
    Kumar, Mohit
    Singh, Ranveer
    Nandy, Suman
    Ghosh, Arnab
    Rath, Satchidananda
    Som, Tapobrata
    Journal of Applied Physics, 2016, 120 (01):
  • [29] Calorimetric determination of NiAl3-growth kinetics in sputter-deposited Ni/Al diffusion couples
    Michaelsen, C
    Barmak, K
    JOURNAL OF ALLOYS AND COMPOUNDS, 1997, 257 (1-2) : 211 - 214
  • [30] Tunable optoelectronic properties of pulsed dc sputter-deposited ZnO:Al thin films: Role of growth angle
    Kumar, Mohit
    Singh, Ranveer
    Nandy, Suman
    Ghosh, Arnab
    Rath, Satchidananda
    Som, Tapobrata
    JOURNAL OF APPLIED PHYSICS, 2016, 120 (01)
12345