Etch characteristics of MgO thin films in Cl2/Ar, CH 3OH/Ar and CH4/Ar plasmas

被引：0
作者：
Lee, Il Hoon [1 ]
Lee, Tea Young [1 ]
Hwang, Su Min [1 ]
Chung, Chee Won [1 ]
机构：
[1] Department of Chemical Engineering, Inha University, 100 Inha-ro, Nam-gu, Incheon 402-751, Korea, Republic of
来源：
Vacuum | 2014年 / 101卷
关键词：
Gases;
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页码：394 / 398
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