Morphology of the asymmetric iron-silicon interfaces

被引:6
作者
Badia-Romano, L. [1 ,2 ]
Rubin, J. [1 ,3 ]
Bartolome, F. [1 ,2 ]
Magen, C. [2 ,4 ,5 ]
Bartolome, J. [1 ,2 ]
Varnakov, S. N. [6 ,7 ]
Ovchinnikov, S. G. [6 ,7 ]
Rubio-Zuazo, J. [8 ,9 ]
Castro, G. R. [8 ,9 ]
机构
[1] Univ Zaragoza, CSIC, Inst Ciencia Mat Aragon, E-50009 Zaragoza, Spain
[2] Univ Zaragoza, Dept Fis Mat Condensada, E-50009 Zaragoza, Spain
[3] Univ Zaragoza, Dept Ciencia Mat & Ingn Met, E-50018 Zaragoza, Spain
[4] Univ Zaragoza, INA, LMA, E-50018 Zaragoza, Spain
[5] Fdn ARAID, E-50004 Zaragoza, Spain
[6] Russian Acad Sci, Kirensky Inst Phys, Siberian Div, Krasnoyarsk 660036, Russia
[7] Siberian Aerosp Univ, Krasnoyarsk 660014, Russia
[8] ESRF, SpLine Spanish CRG, F-38043 Grenoble, France
[9] CSIC, Inst Ciencia Mat Madrid, Madrid, Spain
基金
奥地利科学基金会;
关键词
Fe/Si nanolayers; Interfaces; Fe silicides; Compositional depth; HAXPES; CEMS; AUGER-ELECTRON-SPECTROSCOPY; MEAN ESCAPE DEPTH; X-RAY; PHOTOELECTRON-SPECTROSCOPY; MAGNETIC-PROPERTIES; INFORMATION DEPTH; ROOM-TEMPERATURE; CROSS-SECTIONS; FE; FILMS;
D O I
10.1016/j.jallcom.2014.12.019
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
A systematic study of the iron-silicon interfaces formed upon preparation of (Fe/Si) multilayers has been performed by combination of modern and powerful techniques. Samples were prepared by thermal evaporation under ultrahigh vacuum onto a Si(100) substrate. The morphology of these films and their interfaces was studied by a combination of scanning transmission electron microscopy, X-ray reflectivity, angle resolved X-ray photoelectron spectroscopy and hard X-ray photoelectron spectroscopy. The Si-on-Fe interface thickness and roughness were determined to be 1.4(1) nm and 0.6(1) nm, respectively. Moreover, determination of the stable phases formed at both Fe-on-Si and Si-on-Fe interfaces was performed using conversion electron Mossbauer spectroscopy on multilayers with well separated Si-on-Fe and Fe-on-Si interfaces. It is shown that while a fraction of Fe remains as alpha-Fe, the rest has reacted with Si, forming the paramagnetic c-Fe1-xSi phase and a ferromagnetic Fe rich silicide (DO3 type phase). We conclude that the paramagnetic c-Fe1-xSi silicide sublayer is identical in both Si-on-Fe and Fe-on-Si interfaces, whereas an asymmetry is revealed in the composition of the ferromagnetic silicide sublayer. (C) 2014 Elsevier B.V. All rights reserved.
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页码:136 / 145
页数:10
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