Effect of cerium impurity on the stable growth of the 4H-SiC polytype by the physical vapour transport method

被引:2
|
作者
Racka-Szmidt K. [1 ]
Tymicki E. [1 ,2 ]
Raczkiewicz M. [1 ,2 ]
Sar J. [1 ]
Wejrzanowski T. [3 ]
Grasza K. [4 ]
机构
[1] Łukasiewicz Research Network - Institute of Microelectronics and Photonics, Al. Lotników 32/46, Warsaw
[2] ENSEMBLE3 Sp. z o.o, 133 Wolczynska Str, Warsaw
[3] Warsaw University of Technology, Faculty of Materials Science and Engineering, 141 Wołoska Str, Warsaw
[4] Institute of Physics of the Polish Academy of Sciences, Al. Lotników 32/46, Warsaw
关键词
A1; Characterization; A1. Crystal structure; A2. Growth from vapor; A2. Single crystal growth; B1. Cerium compounds; B1. Silicon carbide;
D O I
10.1016/j.jcrysgro.2022.126616
中图分类号
学科分类号
摘要
Effect of cerium impurity in the SiC source material on the 4H-SiC growth was investigated. 4H-SiC crystals were grown on 6H-SiC crystal seeds by physical vapor transport and using the open seed backside method. Cerium is the impurity used for promotion of the 4H polytype nucleation. The optimal amount of CeO2 for the growth of 4H-SiC with a good crystalline quality and without undesired 15R- and 6H-SiC inclusions was identified. The open seed backside method combined with the presence of cerium impurity in the growth chamber were more effective for the crystal growth process due to a lower degradation of the backside surface of the grown crystal. © 2022
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