Erratum: Power Matching to Pulsed Inductively Coupled Plasmas (J. Appl. Phys. (2020) 127 (133302) DOI: 10.1063/5.0002522)

被引：0

作者：

Qu, Chenhui ^{[1
]}

Lanham, Steven J. ^{[2
]}

Shannon, Steven C. ^{[3
]}

Nam, Sang Ki ^{[4
]}

Kushner, Mark J. ^{[1
]}

机构：

[1] Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor,MI,48109-2122, United States

[2] Department of Chemical Engineering, University of Michigan, Ann Arbor,MI,48109-2136, United States

[3] Department of Nuclear Engineering, North Carolina State University, Raleigh,NC,27695-7909, United States

[4] Mechatronics RandD Center, Samsung Electronics Co., Ltd, 1-1 Samsungjeonja-ro, Hwaseong-si, Gyeonggi-do,18448, Korea, Republic of

来源：

Journal of Applied Physics | 2020年 / 128卷 / 08期

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摘要：

This erratum applies to the paper Power Matching to Pulsed Inductively Coupled Plasmas.1 In this paper, we discussed power deposition in continuous wave and pulsed electronegative Ar/Cl2 inductively coupled plasmas considering E-H (capacitive-to-inductive) transitions and optimization of power transfer using an impedance matching network (IMN). There were typographical errors regarding the power reflection coefficient Γ described in the Introduction. The reflection coefficient ΓR in Eq. (1) of Ref. 1, (Formula Presented). © 2020 Institute of Electrical and Electronics Engineers Inc.. All rights reserved.

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