Systematic compositional analysis of sputter-deposited boron-containing thin films

被引：0

作者：

Bakhit, Babak ^{[1
]}

Primetzhofer, Daniel ^{[2
]}

Pitthan, Eduardo ^{[2
]}

Sortica, Mauricio A. ^{[2
]}

Ntemou, Eleni ^{[2
]}

Rosen, Johanna ^{[1
]}

Hultman, Lars ^{[1
]}

Petrov, Ivan ^{[1
,3
,4
]}

Greczynski, Grzegorz ^{[1
]}

机构：

[1] Thin Film Physics Division, Department of Physics (IFM), LinkÃ¶ping University, LinkÃ¶ping,SE-58183, Sweden

[2] Applied Nuclear Physics, Department of Physics and Astronomy, Uppsala University, Uppsala,SE-75120, Sweden

[3] Materials Research Laboratory, Department of Materials Science, University of Illinois, Urbana,IL,61801, United States

[4] Department of Materials Science and Engineering, National Taiwan University of Science and Technology, Taipei,10607, Taiwan

来源：

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films | 2021年 / 39卷 / 06期

关键词：

Compendex;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Boron - Energy dispersive spectroscopy - Titanium compounds - Chemical bonds - Metal analysis - Rutherford backscattering spectroscopy - X ray photoelectron spectroscopy - Borides - Energy dissipation - Transition metals - Zirconium compounds - Aluminum compounds - Nuclear reactions

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