Effect of Surface Produced H̄ Ion on the Plasma Meniscus in Negative Hydrogen Ion Sources

被引:0
作者
Hayashi K. [1 ]
Hoshino K. [1 ]
Hatayama A. [1 ]
Miyamoto K. [2 ]
Lettry J. [3 ]
机构
[1] Keio University, Kanagawa
[2] Naruto University of Education, Tokushima
[3] CERN Rte de Meyrin, Geneva
基金
日本学术振兴会;
关键词
negative ion source; particle-in-cell; plasma meniscus; surface-produced ion;
D O I
10.1585/PFR.18.1401008
中图分类号
学科分类号
摘要
To extract intense ion beams with good beam optics from ion sources, controlling the distance deff between the plasma meniscus (i.e., beam emission surface) and the beam extraction grid is important. This study conducts a novel investigation into the dependence of the effective distance deff on the amount of surface H̄ production SH-. For this purpose, a 3D PIC (three dimensional Particle-in-Cell) simulation is conducted to obtain a model geometry of the extraction region for a H̄ ion source with SH- as a parameter. Based on results, deff significantly depends on SH- and the H̄-electron density ratio (α = nH̄=ne) in front of the extraction aperture for the same plasma density; as SH- increases, deff decreases. The results suggest that SH- is critical for controlling deff and the resultant beam optics extracted from the negative ion source © 2023 The Japan Society of Plasma Science and Nuclear Fusion Research
引用
收藏
相关论文
共 32 条
  • [1] Lettry J., Et al., Rev. Sci. Instrum, 85, (2014)
  • [2] Lettry J., Et al., Rev. Sci. Instrum, 87, (2016)
  • [3] Hemsworth R., Et al., Nucl. Fusion, 49, (2009)
  • [4] Kashiwagi M., Et al., Rev. Sci. Instrum, 83, (2012)
  • [5] Tsumori K., Et al., Rev. Sci. Instrum, 87, (2016)
  • [6] Fantz U., Et al., Rev. Sci. Instrum, 87, (2016)
  • [7] Etoh H., Et al., AIP Conf. Proc, 1869, (2017)
  • [8] Onai M., Et al., AIP Conf. Proc, 1869, (2017)
  • [9] Humphries S., Charged Particle Beams, (1990)
  • [10] Zhang H., Ion Sources, (1999)