Preparation of T-carbon by plasma enhanced chemical vapor deposition

被引：0

作者：

Xu, Kai ^{[1
]}

Liu, Hao ^{[1
]}

Shi, Yan-Chao ^{[1
]}

You, Jing-Yang ^{[2
]}

Ma, Xing-Yu ^{[2
]}

Cui, Hui-Juan ^{[2
]}

Yan, Qing-Bo ^{[1
]}

Chen, Guang-Chao ^{[1
]}

Su, Gang ^{[2
]}

机构：

[1] College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing,100049, China

[2] School of Physical Sciences, Kavli Institute for Theoretical Sciences, CAS Center of Excellence in Topological Quantum Computation, University of Chinese Academy of Sciences, Beijing,100049, China

来源：

Carbon | 2020年 / 157卷

基金：

中国国家自然科学基金;

关键词：

Plasma CVD - High resolution electron microscopy - Throughput;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

A novel carbon allotrope, T-carbon, is attempted to obtain by using plasma enhanced chemical vapor deposition (PECVD) on the substrates of polycrystalline diamond and single crystalline diamond, respectively. Our measured x-ray diffraction, Raman and infrared spectra of the new form of carbon are in good agreement with the calculated results of T-carbon, and the lattice parameter meets with the results of calculation as well as the high resolution electron microscopy of T-carbon nanowires synthesized by the pulsed laser irradiating modification of carbon multiwall nanotubes, revealing that the phase of T-carbon can be identified in our samples. The experimental preparation of T-carbon by PECVD method indicates that the massive production of T-carbon may be feasible, and extensive investigations with high-throughput experiments on this novel phase are highly expected. © 2019 Elsevier Ltd

引用

页码：270 / 276