Strain alleviation and light emission improvement of indium-doped β-Ga2O3 films

被引:2
作者
Ren, Wei [1 ,2 ]
Li, Xue-Mei [1 ]
Fan, Wei-Tao [2 ]
Wang, Wei-Li [2 ]
Li, Sai-Rui [1 ]
Liu, Xian-Hai [1 ]
Li, Nan [2 ]
Liu, Guang-Hui [2 ]
Weng, Xiang [2 ]
机构
[1] Xian Univ Posts & Telecommun, Sch Sci, Xian 710121, Peoples R China
[2] Northwestern Polytech Univ, Xian 710072, Peoples R China
基金
中国国家自然科学基金;
关键词
Gallium oxide; Thin film; Indium addition; Photoluminescence; Heat treatment; THIN-FILMS; OPTICAL-PROPERTIES; GA2O3; FILMS;
D O I
10.1016/j.jlumin.2024.120685
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The structural and optical properties of the indium-doped /3-Ga2O3 films were investigated. Doping the film with more indium alleviates the film strain, leading to the reduction of the size and amount of the holes in the films. The increase of annealing temperature enlarges the holes and makes the film surface flatter. For luminescence performance, addition of more indium slightly inhibits deep ultraviolet (275 nm) light emission of the films and greatly inhibits the near-infrared emission (720 nm). Annealing the /3-Ga2O3 film at higher temperature improve its ultraviolet and near-infrared emission. The mechanisms were revealed.
引用
收藏
页数:8
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