Low temperature, area-selective atomic layer deposition of NiO and Ni

被引：0
|
作者：
Nallan, Himamshu C. [1 ]
Yang, Xin [1 ]
Coffey, Brennan M. [1 ]
Ekerdt, John G. [1 ]
机构：
[1] McKetta Department of Chemical Engineering, University of Texas at Austin, Austin,TX,78712, United States
来源：
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films | 2022年 / 40卷 / 06期
关键词：
Nickel oxide;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] Low temperature, area-selective atomic layer deposition of NiO and Ni
    Nallan, Himamshu C.
    Yang, Xin
    Coffey, Brennan M.
    Ekerdt, John G.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2022, 40 (06):
  • [2] Atomic Layer Deposition of Ni Thin Films and Application to Area-Selective Deposition
    Kim, Woo-Hee
    Lee, Han-Bo-Ram
    Heo, Kwang
    Lee, Young Kuk
    Chung, Taek-Mo
    Kim, Chang Gyoun
    Hong, Seunghun
    Heo, Jong
    Kim, Hyungjun
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2011, 158 (01) : D1 - D5
  • [3] Area-selective atomic layer deposition of palladium
    Nallan, Himamshu C.
    Yang, Xin
    Coffey, Brennan M.
    Dolocan, Andrei
    Ekerdt, John G.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2024, 42 (02):
  • [4] Approaches and opportunities for area-selective atomic layer deposition
    Mackus, Adriaan J. M.
    2018 INTERNATIONAL SYMPOSIUM ON VLSI TECHNOLOGY, SYSTEMS AND APPLICATION (VLSI-TSA), 2018,
  • [5] Inherent area-selective atomic layer deposition of ZnS
    Zhang, Chao
    Vehkamaki, Marko
    Leskela, Markku
    Ritala, Mikko
    DALTON TRANSACTIONS, 2023, 52 (28) : 9622 - 9630
  • [6] Area-selective atomic layer deposition of molybdenum oxide
    Kvalvik, Julie Nitsche
    Borgersen, Jon
    Hansen, Per-Anders
    Nilsen, Ola
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2020, 38 (04):
  • [7] Atomic layer deposition and selective etching of ruthenium for area-selective deposition: Temperature dependence and supercycle design
    Vos, Martijn F. J.
    Chopra, Sonali N.
    Ekerdt, John G.
    Agarwal, Sumit
    Kessels, Wilhelmus M. M.
    Mackus, Adriaan J. M.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2021, 39 (03):
  • [8] Area-Selective Deposition of Ruthenium by Combining Atomic Layer Deposition and Selective Etching
    Vos, Martijn F. J.
    Chopra, Sonali N.
    Verheijen, Marcel A.
    Ekerdt, John G.
    Agarwal, Sumit
    Kessels, Wilhelmus M. M.
    Mackus, Adriaan J. M.
    CHEMISTRY OF MATERIALS, 2019, 31 (11) : 3878 - 3882
  • [9] Role of Precursor Choice on Area-Selective Atomic Layer Deposition
    Oh, Il-Kwon
    Sandoval, Tania E.
    Liu, Tzu-Ling
    Richey, Nathaniel E.
    Bent, Stacey F.
    CHEMISTRY OF MATERIALS, 2021, 33 (11) : 3926 - 3935
  • [10] Theoretical Design Strategies for Area-Selective Atomic Layer Deposition
    Kim, Miso
    Kim, Jiwon
    Kwon, Sujin
    Lee, Soo Hyun
    Eom, Hyobin
    Shong, Bonggeun
    CHEMISTRY OF MATERIALS, 2024, 36 (11) : 5313 - 5324
12345