Low temperature, area-selective atomic layer deposition of NiO and Ni

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作者：
Nallan, Himamshu C. [1 ]
Yang, Xin [1 ]
Coffey, Brennan M. [1 ]
Ekerdt, John G. [1 ]
机构：
[1] McKetta Department of Chemical Engineering, University of Texas at Austin, Austin,TX,78712, United States
来源：
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films | 2022年 / 40卷 / 06期
关键词：
Nickel oxide;
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