Competition between silicon, beryllium and phosphorus atoms in the formation of surface chemical compounds on (1010) Re

被引:1
作者
Rut'kov, E. V. [1 ]
Afanas'eva, E. Y. [1 ]
Gall, N. R. [1 ]
机构
[1] Ioffe Inst, Politech Skaya 26, St Petersburg 194021, Russia
关键词
Surface compounds; Phosphorus; Beryllium; Silicon; Rhenium; Coadsorption; SULFUR;
D O I
10.1016/j.susc.2024.122523
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
High-temperature joint adsorption has been studied of three different adsorbates, Si, Be, and P on the (1010 ) Re face. All three adsorbates form surface compounds with the stoichiometry ReX, where Xis Si, Be, and P. In joint adsorption, one of the adsorbates is displaced into the bulk, into the dissolved state. The processes are observed at a temperature sufficient for diffusion in the bulk, 1100-1300 K. Displacement occurs in an atom-to-atom mode, and it has a "cyclic nature": silicon displaces phosphorus, beryllium displaces silicon, and phosphorus- beryllium.
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页数:4
相关论文
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