Materials to System Co-optimization (MSCO™) for SRAM and its application towards Gate-All-Around Technology

被引：0

作者：

Vyas, Pratik B. ^{[1
]}

Pal, Ashish ^{[1
]}

Costrini, Gregory ^{[1
]}

Asenov, Plamen ^{[2
]}

Mhedhbi, Sarra ^{[1
]}

Zhao, Charisse ^{[1
]}

Moroz, Victor ^{[2
]}

Colombeau, Benjamin ^{[1
]}

Haran, Bala ^{[1
]}

Bazizi, El Mehdi ^{[1
]}

Ayyagari-Sangamalli, Buvna ^{[1
]}

机构：

[1] Applied Materials, Santa Clara, United States

[2] Synopsys Inc., Mountain View, United States

来源：

International Conference on Simulation of Semiconductor Processes and Devices, SISPAD | 2023年

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D O I：

暂无

中图分类号：

学科分类号：

摘要：

Integrated circuit design - Integrated circuit manufacture - Nanosheets - Timing circuits

引用

页码：53 / 56