Room-Temperature Atomic Layer Deposition of Elemental Antimony

被引：0
|
作者：
Al Hareri, Majeda [1 ]
Emslie, David J. H. [1 ]
机构：
[1] Department of Chemistry, McMaster University, 1280 Main Street West, Hamilton,ON,L8S 4M1, Canada
来源：
Chemistry of Materials | 2022年 / 34卷 / 05期
基金：
加拿大自然科学与工程研究理事会;
关键词：
Atomic-layer deposition - Deposition cycles - Hydrogen-terminated silicon - Impurity level - Preferential orientation - Si substrates - Substrate surface - Surface pre-treatments - Temperature range - XRD;
D O I：
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中图分类号：
学科分类号：
摘要：
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页码：2400 / 2409
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