Insulator Surface Charge Measurement Using an Improved Capacitive Probe

被引：0

作者：

汪沨 ^{[1
]}

邱毓昌 ^{[2
]}

李欣然 ^{[3
]}

PFEIFFER W ^{[4
]}

KUFFEL E ^{[5
]}

机构：

[1] State Key Lab for Electrical Insulation and Apparatus, Xi'an Jiaotong University, Xi'an , China School of Electrical and Information Engineering, Hunan University, Changsha , China

[2] State Key Lab for Electrical Insulation and Apparatus, Xi'an Jiaotong University, Xi'an , China

[3] School of Electrical and Information Engineering, Hunan University, Changsha , China

[4] Technische Universitat Darmstadt, Darmstadt, Germany

[5] Dept of Electrical Engineering and Computer Science, University of Manitoba, Winnipeg,

来源：

Plasma Science and Technology | 2006年 / 8卷 / 05期

关键词：

D O I：

暂无

中图分类号：

O462 [阴极电子学];

学科分类号：

摘要：

<正> A surface charge measuring system using the capacitive probe method is analysed. The present study shows that the measuring system cannot have a steady-state output and that the error resulting from the finite leakage resistance of the measuring system will be accumulated during the measuring process. Based on the theoretical analysis a new type probe with a low charge leakage and high resolution is designed. The surface charge accumulated on the Teflon insulator under a DC voltage is measured using this new probe and some phenomena of the surface charging are reported.

引用

页码：565 / 568

页数：4

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