Electronicstructuresofhalogen-dopedCu2ObasedonDFTcalculations

被引:0
作者
赵宗彦
易娟
周大成
机构
[1] FacultyofMaterialsScienceandEngineering,KeyLaboratoryofAdvancedMaterialsofYunnanProvince,KunmingUniversityofScienceandTechnology
关键词
cuprous oxide; halogen doping; DFT calculations; n-type conductivity;
D O I
暂无
中图分类号
TM914.42 [];
学科分类号
080502 ;
摘要
In order to construct p–n homojunction of Cu2O-based thin film solar cells that may increase its conversion efficiency, to synthesize n-type Cu2O with high conductivity is extremely crucial, and considered as a challenge in the near future. The doping effects of halogen on electronic structure of Cu2O have been investigated by density function theory calculations in the present work. Halogen dopants form donor levels below the bottom of conduction band through gaining or losing electrons, suggesting that halogen doping could make Cu2O have n-type conductivity. The lattice distortion, the impurity formation energy, the position, and the band width of donor level of Cu2O1 xHx(H = F, Cl, Br, I) increase with the halogen atomic number. Based on the calculated results, chlorine doping is an effective n-type dopant for Cu2O, owing to the lower impurity formation energy and suitable donor level.
引用
收藏
页码:416 / 420
页数:5
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