Numerical investigations of an optical switch based on a silicon stripe waveguide embedded with vanadium dioxide layers

A novel scheme for the design of an ultra-compact and high-performance optical switch is proposed and investigated numerically. Based on a standard silicon（Si） photonic stripe waveguide, a section of hyperbolic metamaterials（HMM） consisting of 20-pair alternating vanadium dioxide （VO2）∕Si thin layers is inserted to realize the switching of fundamental TE mode propagation. Finite-element-method simulation results show that, with the help of an HMM with a size of 400 nm × 220 nm × 200 nm（width × height × length）, the ON/OFF switching for fundamental TE mode propagation in an Si waveguide can be characterized by modulation depth（MD） of5.6 d B and insertion loss（IL） of 1.25 dB. It also allows for a relatively wide operating bandwidth of 215 nm maintaining MD > 5 dB and IL < 1.25 dB. Furthermore, we discuss that the tungsten-doped VO2 layers could be useful for reducing metal-insulator-transition temperature and thus improving switching performance. In general, our findings may provide some useful ideas for optical switch design and application in an on-chip all-optical communication system with a demanding integration level.