Optical behaviour of magnetron sputtered nano-hilled TiN coatings

被引:2
|
作者
Karthikeya, Shreyas [1 ]
Atta, Sayan [1 ]
Rao, K. V. Krishna [1 ]
Dash, Sitaram [1 ]
Narendrakumar, Uttamchand [1 ]
Mathew, Arun Tom [1 ]
机构
[1] Vellore Inst Technol, Sch Mech Engn, Vellore 632014, TN, India
关键词
Titanium nitride (TiN); Cylindrical magnetron sputtering; Optical properties; UV-Vis-NiR spectrophotometer; Spectroscopic ellipsometry; THIN-FILMS; ELECTRICAL-PROPERTIES; MICROSTRUCTURE; DEPOSITION; RATIO;
D O I
10.1016/j.optmat.2024.115838
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Cylindrical magnetron sputtered TiN thin films have been grown on glass (G) and quartz (Q) substrates to examine optical properties under two flow conditions: increasing nitrogen flow rate (1 -> 35 sccm): (I) and decreasing nitrogen flow rate (35 -> 1 sccm): (D). The optical properties of the film are characterized using UV-Vis-NiR spectroscopy, spectroscopic ellipsometry, and photoluminescence studies. Films deposited under both parameters exhibited excellent UV-restriction properties. Nano-hilled topography of the film contributed to multiple reflections and scattering of incident light on both quartz and glass specimens. Clustering of nano- particles in G(D) specimen increases the light interaction and absorption within the film leading to higher absorbance and lower transmittance properties compared to G(I). TiN-Quartz specimen displayed better UV absorbing properties compared to TiN-Glass as confirmed through ellipsometry studies. lack of phonon-related transitions in Tauc's plot indicated the involvement of direct allowed transitions.
引用
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页数:11
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