Existence probabilities of single Si atoms diffusing in Si(111)-(7 x 7) half-unit cells at room temperature

被引:0
|
作者
Ueda, K. [1 ,2 ]
Diao, Z. [2 ]
Hou, L. [2 ]
Yamashita, H. [2 ]
Abe, M. [2 ]
机构
[1] Tokyo Metropolitan Ind Technol Res Inst, 2-4-10 Aomi,Koto ku, Tokyo 1350064, Japan
[2] Osaka Univ, Grad Sch Engn Sci, 1-3 Machikaneyama, Toyonaka, Osaka 5600043, Japan
关键词
SURFACE-DIFFUSION; INITIAL-STAGES; DYNAMICS; GROWTH; STM; PB;
D O I
10.1063/5.0214330
中图分类号
O59 [应用物理学];
学科分类号
摘要
We determined the probabilities of finding diffusing Si atoms in faulted and unfaulted half-unit cells on the Si(111)-(7 x 7) surface. An adsorbed Si atom on the surface at room temperature moved in the half-unit cells. The atom was adsorbed via atom manipulation and located via under-sampled scanning tunneling microscopy. Images of the half-unit cells with the diffusing Si atom and images of the clean surface were superimposed via image processing to calculate differences used to determine the Si atom positions at room temperature. There were different probabilities for Si atom diffusion in faulted and unfaulted half-unit cells.
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页数:6
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